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Performance assessment of CsI(Tl) screens on various substrates for X-ray imaging

机译:CsI(Tl)屏幕在各种基材上的性能评估   X射线成像

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摘要

Thallium-doped cesium iodide (CsI(Tl)) screens are widely used in X-rayimaging devices because of the columnar structure of CsI(Tl) layer, but fewreports focus on the optical role of the substrate in the screen system. Inthis paper, four substrates including fused silica (SiO2), silver-film coatedSiO2, graphite (C) and fiber optic plate (FOP) are used to fabricate CsI(Tl)screens by thermal evaporation. Their imaging performance is evaluated byrelative light output (RLO), modulation transfer function (MTF), normalizednoise power spectrum (NNPS) and noise equivalent quanta (NEQ). The resultsreveal that although CsI(Tl) film on graphite plate yields images with thelowest light output, it presents relatively higher spatial resolution andbetter signal-to-noise characteristics. However, films on SiO2 plate obtain lowMTF but high NNPS curves, whether or not coated with silver film. Furthermore,scintillation screens on FOP have bright images with low NNPS and high NEQ, buthave the lowest MTF. By controlling the substrate optical features, CsI(Tl)films can be tailed to suit a given application.
机译:由于CsI(Tl)层的柱状结构,掺杂碘化铯(CsI(Tl))屏幕被广泛用于X射线成像设备中,但是很少有报道关注屏幕系统中基板的光学作用。在本文中,包括熔融二氧化硅(SiO2),涂银膜的SiO2,石墨(C)和光纤板(FOP)的四个基板用于通过热蒸发来制造CsI(Tl)屏幕。它们的成像性能通过相对光输出(RLO),调制传递函数(MTF),归一化噪声功率谱(NNPS)和噪声等效量(NEQ)进行评估。结果表明,尽管石墨板上的CsI(Tl)膜产生的图像具有最低的光输出,但它具有相对较高的空间分辨率和更好的信噪比特性。但是,无论是否涂有银膜,SiO2板上的膜都具有较低的MTF和较高的NNPS曲线。此外,FOP上的闪烁屏幕具有较低的NNPS和较高的NEQ的明亮图像,但MTF最低。通过控制基板的光学特性,可以将CsI(Tl)薄膜拖尾以适合给定的应用。

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